Abstract

We fabricated thin films of (PbZr0.53Ti0.47)O3 (PZT) and (PbZr0.53Ti0.47)0.90(LaxSc1-x)0.10O3 where; x= 0, 0.2, 0.4, 0.6 and 0.8 denoted as [abbr. PL10x] PL0, PL2, PL4, PL6, and PL8 respectively on the LSMO buffer layer (bottom electrode) by using a PLD technique. The X-ray diffraction peaks show a single-phase perovskite structure of thin films with a preferred (100) orientation that coincides with the MgO and has tetragonal phase symmetry (P4mm). Pt electrodes were deposited at the top of thin films as top electrodes. We achieved higher dielectric permittivity (ε’) for PL0 and PL6 compared to other compositions. We noticed that the role of increasing lanthanum content (decreasing scandium) resulted in the broadening of ε’ with temperature and ferroelectric phase transition decreased to 450 K. However, the scandium doping alone (PL0) didn’t lower the ferroelectric phase transition. We analyzed the temperature-dependent ε’ using the modified Curie-Weiss law. The PL0, PL6, and PL8 thin film capacitors exhibited relaxor ferroelectric properties that were further supported by the Vogel-Fulcher relation.The P-E hysteresis loops exhibited the role of lanthanum and scandium causing compositional changes in coercive fields. The P-E loops of PZT, PL2, and PL4 exhibited typical ferroelectric features. Whereas, PL0, PL6, and PL8 showed a relaxor ferroelectric behavior which was corroborated by the analysis of the dielectric data. The PL0 and PL6 thin films showed better spontaneous polarization Ps. We achieved superior energy storage performance Ure = 54.63 J/cm3 with η ~ 70% for PL0 and Ure = 26.54 J/cm3 with η ~ 66% for PL8 thin film capacitors. The study demonstrated the idea that by tuning La3+ and Sc3+ the dielectric and ferroelectric properties of thin films can be controlled for suitable electronic applications, such as memory, power devices, and energy storage.

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