Abstract
AbstractFerroelectric Pb(Zr0.52Ti0.48)O3 or PZT (52/48) thin-films (0.5 μm) were integrated onto Pt passivated Si wafers (3–4 inches) by polymeric solgel processing followed by rapid thermal annealing. Dense and crack-free perovskite microstructures were obtained by densification of the amorphous gel-matrix prior to crystallization. The films exhibited submicron grains (0.2–0.6 μm) with a columnar growth habit. High field measurements on thin-films determined Pr, Psp, and Ec in the ranges of 29–32 μC/cm2. 44–58 μC/cm2, and 50–60 kV/cm, respectively, and ferroelectric switching times below 3 ns.
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