Abstract
Microstructures are fabricated with a fast fabrication speed, submicron-scale precision and a minimum feature size of 1.5 μm. The proposed rapid prototyping fabrication method takes advantage of the maskless lithography technique based on a digital mirror device (DMD) and photocurable resin, which has a broad range of uses in three-dimensional (3D) printing. To illustrate the feasibility of this method, a Dammann grating is fabricated. Using a series of experiments and optimized designs, we analyze the characteristics of the photocurable resin, quantify the dose modulation for lithography and redesign the mask pattern. Consequently, a Dammann grating with a 50% diffraction efficiency is successfully fabricated, which can not only guarantee the precision but also maintain the fabrication speed. This work demonstrates the potential of this method to rapidly and directly manufacture binary optical elements or structures at the nanoscale based on photocurable resin and DMD-based maskless lithography.
Highlights
To meet the changing needs associated with the fabrication of optical elements, maskless lithography has been used for the fabrication of micro- and nanoscale structures
The proposed rapid prototyping fabrication method takes advantage of the maskless lithography technique based on a digital mirror device (DMD) and photocurable resin, which has a broad range of uses in three-dimensional (3D) printing
This work demonstrates the potential of this method to rapidly and directly manufacture binary optical elements or structures at the nanoscale based on photocurable resin and DMD-based maskless lithography
Summary
To meet the changing needs associated with the fabrication of optical elements, maskless lithography has been used for the fabrication of micro- and nanoscale structures. Several methods are used to fabricate binary optical elements, such as electron-beam (e-beam) lithography [1]–[3], two-photon lithography (2PL) [4]–[6], and scanning-probe-based techniques [7], [8]. These maskless lithography methods have complicated processes, long manufacturing times and high cost. There is one maskless lithography method based on a digital mirror device (DMD) that broadly uses fabrication of micro- and nano-structures at present [9]–[13]. With the advancement of DMD-based lithography, a submicron structure has been achieved, showing the potential for nanoscale structures to be constructed using this inexpensive and efficient method
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