Abstract
Hierarchically structured silicon (Si) surfaces with a combination of micro/nano-structures are highly explored for their unique surface and optical properties. In this context, we propose a rapid and facile electroless method to realize hierarchical structures on an entire Si wafer of 3″ diameter. The overall process takes only 65 s to complete, unlike any conventional wet chemical approach that often combines a wet anisotropic etching of (100) Si followed by a metal nanoparticle catalyst etching. Hierarchical surface texturing on Si demonstrates a broadband highly reduced reflectance with average R% ~ 2.7% within 300–1400 nm wavelength. The as-fabricated hierarchical structured Si was also templated on a thin transparent layer of Polydimethylsiloxane (PDMS) that further demonstrated prospects for improved solar encapsulation with high optical clarity and low reflectance (90% and 2.8%).
Highlights
There has been an exponential growth in the field of micro/nano-texturing of a silicon (Si) surface due to its attractive properties like controllable surface wettability and optical properties [1,2,3].Especially hierarchical structures with a unique combination of micro/nano-structures on Si that makes them highly useful for applications like self-cleaning, solar cell, photoluminescence, contamination prevention, etc. [3,4,5]
Various techniques like vapor-liquid-solid (VLS), reactive ion etching (RIE), electrochemical etching, and wet anisotropic electroless etching have been used for fabricating micro and nano-structures on Si surfaces [5,6,7,8,9]
The integrating sphere is equipped with two detectors—photomultiplier tube (PMT) and InGaAs and can scan wavelengths from 220 nm to 1400 nm
Summary
There has been an exponential growth in the field of micro/nano-texturing of a silicon (Si) surface due to its attractive properties like controllable surface wettability and optical properties [1,2,3].Especially hierarchical structures with a unique combination of micro/nano-structures on Si that makes them highly useful for applications like self-cleaning, solar cell, photoluminescence, contamination prevention, etc. [3,4,5]. There has been an exponential growth in the field of micro/nano-texturing of a silicon (Si) surface due to its attractive properties like controllable surface wettability and optical properties [1,2,3]. Hierarchical structures with a unique combination of micro/nano-structures on Si that makes them highly useful for applications like self-cleaning, solar cell, photoluminescence, contamination prevention, etc. Various techniques like vapor-liquid-solid (VLS), reactive ion etching (RIE), electrochemical etching, and wet anisotropic electroless etching have been used for fabricating micro and nano-structures on Si surfaces [5,6,7,8,9]. Despite the ease and simple process of wet electrochemical and electroless etching, they result in a non-uniform and poorly controllable porous structure. The type of micro/nano pattern generated using wet chemical etching is dependent on the crystal orientation
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