Abstract
A novel micro-focus X-ray tube in combination with a focusing optic that uses total external reflection has been used to enhance the diffracted intensity in a double-crystal experiment, whilst simultaneously reducing the beam footprint on the sample. The increased intensity allows data to be collected more quickly. Advances in auto-fitting using the full dynamical theory of X-ray diffraction mean that sample material parameters can be extracted quickly and objectively, opening the way to automatic data analysis. Both features are attractive for non-destructive quality control of semiconductor device structures, as well as for process development and research purposes.
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