Abstract
Diamond synthesis and its morphology by in-liquid plasma chemical vapor deposition (CVD) method are investigated in this study. Diamond films were grown on Si substrates from mixed alcohol solution. Very high growth rate of 170μm/h was achieved by this method. Microcrystalline and nanocrystalline diamond films were formed in different conditions. In the case of microcrystalline film, the shapes of diamond grains depend on the location in the film. All morphological differences in this study can be explained by the same mechanism of conventional gas phase CVD method. It means diamond morphology by in-liquid plasma CVD method can be controlled by process parameters as well as gas phase CVD method.
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