Abstract
This work describes a method for rapidly and conveniently fabricating high-performance conductive patterns on poly (vinylidene fluoride) substrates using a 248 nm excimer laser. It shows that the artificial active centre, created by laser direct etching technique, could facilely control the formation of modified layer, avoiding the laser threshold in processing. Using the etching lines to structure the nonconductive paths, the controllable patterns can be formed in selective areas through the designed photo-mask when 248nm laser irradiation. The modified layer exhibits a high-grade electrical conductivity of 2.80 Ω(-1)cm(-1) increased by 13 orders of magnitude, and the considerable improvement in conductivity could be attributed to the carbon enrichment, especially the structural formation of C-C.
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