Abstract
AbstractLead zirconate titanate (PZT) thin films have a large application potential in microelectronic devices, memory applications and microelectromechanical systems. Reactive sputtering of a single metallic target in a pulsed DC mode is a promising approach for a fast and cost‐efficient deposition of thin PZT films on an industrial scale. However, for efficient optimization of the process parameters, it is necessary to have access to a rapid tool for chemical depth profiling. We will show in this paper that glow‐discharge optical emission spectroscopy (GD‐OES) is capable of yielding fast and reliable information about the PZT thin film composition. A novel pulsed mode of GD‐OES was applied to bulk PZT samples (for calibrations purposes) and to thin PZT coatings. The influence of different parameters on this pulsed mode will be discussed. Using pulsed GD‐OES we could successfully measure the composition of our PZT thin films and so optimize the deposition process. Copyright © 2006 John Wiley & Sons, Ltd.
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