Abstract
A Raman-scattering study of amorphous-to-crystalline transition in a-Si:H films on quartz and sapphire substrates induced by cw laser annealing is reported. The threshold power density for crystallization is much greater for a-Si:H films on sapphire than on quartz substrates. It is determined that crystallization occurs in a-Si:H films on quartz substrates due to a bulk-induced solid phase process. Crystallization in a-Si:H films on sapphire substrates is due to liquid phase epitaxy. It was found that annealing with laser powers significantly greater than the threshold powers causes substantial stresses at the interface.
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