Abstract
The build-up of intrinsic stress in carbon thin films deposited by vapour deposition can be a major cause of delamination. Arguably, this issue has been one of the main reasons why the industrial exploitation of carbon vapour deposited films has so far been of limited success. In the present study we deposited single and multilayer thin films of carbon and found that under certain deposition conditions, we were able to produce thin films free from delamination. Single and multilayer of films Diamond-like Carbon (DLC) were prepared by Plasma Immersion Ion Implantation and Deposition (PIIID) from two deposition systems: (1) Radio-Frequency (RF) plasma and (2) Filtered Cathodic Vacuum Arc (FCVA). Raman spectroscopy revealed a shift in the peaks previously identified as D and G band in the structures. The sp 2 and sp 3 ratio contents were characterized by Raman spectroscopy.
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