Abstract
Raman spectroscopy has been used to investigate the structure and bonding in a number of carbon films prepared by plasma physical vapour deposition and chemical vapour deposition. Several secondary elements have been introduced into the structure of the coatings to observe their influence on the coating-substrate assembly. The spectra show that the samples arc composed of disordered carbon which is mainly sp 2-bonded, but with some sp 3 bonding. A detailed examination of the low wavenumber region of the specra (< 1,100 cm −1) has revealed evidence for interaction with the silicon substrate. There is also evidence for CH and SiH bonding.
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