Abstract

We consider the Raman amplification problem for silicon waveguides in the regime in which both the pump and signal pulses are relatively short but wide enough that their duration exceeds the phonon lifetime (about 3 ps in silicon). We use the coupled pump-signal equations for numerical simulations that include all competing nonlinear effects such as self- and cross-phase modulations, two-photon and free-carrier absorptions, and changes in the refractive index induced by the free carriers. However, numerical simulations do not provide much physical insight. For this reason, we also develop an approximate analytic approach for solving the Raman amplification problem. We introduce the concept of an effective Raman gain and show analytically how it depends on the pump bandwidth. As the pump spectrum broadens inside the silicon waveguide, the effective Raman gain is reduced considerably. We obtain an analytical form of the nonlinear phase accumulated during propagation inside a silicon waveguide and use it to calculate the total spectral broadening experienced by a pump pulse. Using this result, we can predict changes in the effective Raman gain as a function of pump pulse energy. A comparison of our predictions with the recent experimental data shows that our model is reasonable and captures the essential physics.

Highlights

  • Silicon-on-insulator (SOI) technology has attracted a great deal of attention in recent years owing to its potential for onchip optical data processing [1, 2]

  • We use an approximate analytical method to obtain the effective Raman gain and show that it is reduced from its actual value because of the spectral broadening of pump pulses resulting from SPM and free-carrier induced index changes (FCR) [5]

  • We used a well-known model based on the coupled pump-signal amplitude equations for numerical simulations because such a model includes all competing nonlinear effects such as the Kerr effect, TPA, FCA, and FCR that take place simultaneously

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Summary

INTRODUCTION

Silicon-on-insulator (SOI) technology has attracted a great deal of attention in recent years owing to its potential for onchip optical data processing [1, 2]. The availability of high-quality SOI wafers from the microelectronics industry, coupled with a mature fabrication process, makes it possible to build ultracompact devices with tight confinement of optical modes [5, 11] These localized modes enable nonlinear interaction at relatively low-power levels inside short nanowaveguides (typically 1 cm long). We investigate how the TPA, SPM and FCR processes influence the reduction in the Raman gain by studying analytically the spectral broadening of pump pulses that they produce.

The complete numerical model
Coupled pump–signal equations
Rate equation for the density of free carriers
Numerical solution with the split-step Fourier method
Effective Raman gain
Influence of TPA on SRS
Spectral broadening of the pump pulse and its influence on SRS
Nonlinear phase equation
Characterization of the spectral broadening
Influence of pump-spectrum broadening on effective Raman gain
Spectral width of the SPM-broadened pump pulses
Reduction of the effective Raman gain
Influence of the light-localization effect
Conclusions

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