Abstract
The effects of treatment in a radiofrequency (RF) discharge plasma on the rate of chemical etching of the tracks made by xenon ions (with an energy of ~1 MeV/nucleon) in poly(ethylene terephthalate) (PETP) films were investigated. The influence of plasma treatment conditions on the structure and properties of nuclear track membranes formed by etching was studied. It was found that the RF plasma treatment of heavy ion-bombarded PETP films leads to a decrease in etchability of both tracks and the starting polymer matrix. The changes in track and matrix etchability due to crosslinking of the polymer surface layer were shown to be responsible for the asymmetry of the track membrane structure.
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