Abstract
The basic equations important in the design of rf sputtering equipment are presented. Attention is restricted to the ‘disc and annulus’ system and simple techniques in lead-through fabrication and electrode shielding are described. Also rf power oscillator theory is used to derive the important parameters of power generation. Load coupling and power matching techniques are discussed. Problems of the magnetic field coil design are analysed and a value for the thermal conductivity of coils wound from polyurethane coated wire is given, namely κ = 0.64 W m −1 /°C −1 , permitting the steady state temperature distribution inside such coils to be predicted.
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