Abstract
AbstractThe influence of acrylonitrile‐butadiene‐styrene‐terpolymer (ABS) and methyl methacrylate‐butadiene‐styrene‐terpolymer (MBS) modifying the polystyrene (PS) films on its resistance to UV radiation were investigated.On the basis of the results of ESR, IR, UV, mass spectroscopy, viscosimetric and solubility measurements it was found that 3% of ABS or MBS in polystyrene films have a clear influence on the course of photochemical processes. After UV‐irradiation of the samples, at the presence of this terpolymers, a greater concentration of free radicals with shorter half‐life times was observed.Both terpolymers increase the productivity of photooxydation of polystyrene as well as its crosslinking and decrease its dehydrogenation.
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