Abstract

The photoluminescence (PL) arising in low doped CVD grown n- and p-type 4H-SiC upon electron irradiation (0,9 MeV) has been studied. After each doze of irradiation spectrum of PL was measured. The PL spectrum was dominated by a band peaked at hv ≈ 2,45 eV, commonly observed upon irradiation of SiC. The experiments demonstrated that, for samples with both types of conduction, the PL intensity approaches a constant value with increasing irradiation dose. A model was suggested, describing the PL characteristics in terms of the radiative recombination via a donor-acceptor pair constituted by nitrogen and a structural defect formed in the course of irradiation. Also, the concentration of nitrogen atoms was measured by the SIMS method. The experimental data were used to calculate in terms of the suggested model the dependence of the PL intensity on the irradiation dose. A good agreement between the calculated and experimental dependences was observed. A conclusion is made that the PL is activated by donor—acceptor pairs constituted by a nitrogen atom and a structural defect.

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