Abstract

Additions of solute that trap vacancies slow down vacancy diffusion and promote point-defect recombination in alloys subjected to irradiation. Such selective alloying can thus help to minimize the detrimental consequences resulting from point defect fluxes. The current work investigates the effect of solute additions on the recombination rate using kinetic Monte Carlo simulations for a model alloy system, which was parametrized to Cu-Ag in the dilute limit, but with an increased solubility limit, ≈ 0.86 at.% at 300 K. As the solute concentration was increased above 0.1 at.%, solute clustering was observed and led to a strong increase in recombination rate. The beneficial effects of solute clustering on reducing vacancy mobility, and reducing solute drag, were analyzed by calculating relevant transport coefficients using the KineCluE code (Schuler et al., Computational Materials Science (2020) 172,109,191). Moreover, it was observed in the KMC simulations that large recombination rates resulted in a shift of steady-state distributions of solute cluster sizes to smaller clusters compared to equilibrium distributions in the solid solution. This shift is rationalized as resulting from the irreversible character of the interstitial-vacancy recombination reaction. These results suggest a novel irradiation effect on phase stability where a high recombination rate increases the solubility limit of a solute at steady state over its equilibrium value.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.