Abstract
A synthesis method is presented for determining an excitation of an arbitrary (but fixed) planar source configuration. The desired radiation pattern is specified over all or part of the visible region. It may have multiple and/or shaped main beams with low sidelobes. The iterative sampling method is used to find an excitation of the source which yields a radiation pattern that approximates the desired pattern to within a specified tolerance. In this paper the method is used to calculate excitations for line sources, linear arrays (equally and unequally spaced), rectangular apertures, rectangular arrays (arbitrary spacing grid), and circular apertures. Examples using these sources to form patterns with shaped main beams, multiple main beams, shaped sidelobe levels, and combinations thereof are given.
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