Abstract
The thin film exfoliation mechanisms of He+- and H+- implanted rutile-phase titanium dioxide (r-TiO2), as well as the surface morphology and lattice damage in the implanted r-TiO2 samples, are investigated and compared. Layer splitting in the He+-implanted r-TiO2 samples after annealing at 350 °C was observed. Due to the formation of He bubbles accumulated by nano-defects during annealing, the peak damage ratio in the damage layer is enhanced. The microcracks induced by He+-implantation found in the damage layer correspond two types of defects, which were analyzed. In contrast, H+-implantation in the r-TiO2 samples induced only little lattice damage, and with low annealing temperature the damage is almost fully removed, suggesting thermal activity of the implanted H+-ions in the r-TiO2.
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