Abstract
The competitive effect of HCl on H 2PtCl 6 and/or HReO 4 deposition on γ-Al 2O 3 was studied. For this purpose HCl, H 2PtCl 6, and HReO 4 adsorption isotherms were determined, and the radial distribution profiles of the three components were obtained by impregnating cylindrical tablets. The results indicate that HCl and metallic precursors are adsorbed on the alumina surface according to the Langmuir isotherm. It was found that the three components compete for the same surface sites, and the number of occupied surface sites per adsorbed molecule of HCl, HReO 4 and H 2PtCl 6 is 1, 2 and 4, respectively. The adsorbate-support interactions are strong, and the radial profiles are defined during the impregnation step, not being affected by thermal treatments (calcination and H 2 reduction at 500°C). The shape of the radial profiles indicates that the H 2PtCl 6, HCl and HReO 4 adsorption is more rapid than the intraparticle diffusion. The profiles also show HCl as a good competitor to obtain uniform distribution of the metallic precursors.
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