Abstract
The R–curve for Si3N4−40 wt% TiN composites was estimated by the indentation‐strength method and compared to that of monolithic Si3N4 with duplex microstructure. Both materials exhibited rising R‐curve behavior. The Si3N4‐TiN composites, however, displayed better damage tolerance and higher resistance to crack growth. From TEM observation, it was inferred that this superior performance of Si3N4‐TiN composites can be attributed mainly to stress‐induced microcracking at hete rophase (Si3N4/TiN) boundaries.
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