Abstract
AbstractWe here report quick and efficient enhancement of the thermal stability of triblock copolymer‐based bulk morphologies by utilizing photo cross‐linking, which aims for widening the application range of block copolymer‐based materials. First, we synthesized ABA triblock copolymer bearing photo cross‐linkable groups (i. e., benzophenone groups) in the end blocks via two step atom transfer radical polymerizations (ATRP) and subsequent esterification reaction. UV‐light was irradiated for the annealed bulk films at room temperature, and the photo cross‐linking completely progressed within several minutes. Small angle X‐ray scattering (SAXS) and the model fitting analysis revealed that the original cylinder morphology of the neat sample was nicely preserved after the photo cross‐linking, which enables investigation of intrinsic effects of domain cross‐linking. The temperature ramp SAXS measurements demonstrated the photo cross‐linked cylinder structure remained up to the temperature (∼320 °C) much higher than the disordering temperature (∼240 °C) of the neat uncross‐linked structure.
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