Abstract
The rotational switching behavior of electrodeposited thin films is shown to be similar to that reported for vacuum deposited thin films. The influence of the Hc/Hk ratio (0.30–1.1), dispersion (5°–13°) of the easy axis, thickness , and the angle of the applied field to the easy axis were determined on (i) the magnetization path during flux reversal, and (ii) the wall motion and rotational thresholds. The rotational thresholds were compared to the Stoner‐Wohlfarth curve for simple coherent rotation. The separation of the rotational and wall motion thresholds appears to be thickness dependent.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
