Abstract
Ag nanoparticles were fabricated in silica by Xe ion irradiation and subsequent Ag ion implantation, which distributed in a depth range from 4.8 to 14.3 nm, rather than dispersed from surface to a depth of 24.7 nm when no irradiation was made in advance. In addition, the suppression of Ag implants' sputtering loss was also evidenced by a greatly increased Ag content in the prepared sample. These results are mainly due to the defect-enhanced in-beam particle growth. Further, formation of polycrystalline Ag nanoparticles was revealed, whose effect on optical absorption was discussed according to the electron mean-free-path mode.
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