Quasi-two-dimensional Ag nanoparticle formation in silica by Xe ion irradiation and subsequent Ag ion implantation

Abstract

Ag nanoparticles were fabricated in silica by Xe ion irradiation and subsequent Ag ion implantation, which distributed in a depth range from 4.8 to 14.3 nm, rather than dispersed from surface to a depth of 24.7 nm when no irradiation was made in advance. In addition, the suppression of Ag implants' sputtering loss was also evidenced by a greatly increased Ag content in the prepared sample. These results are mainly due to the defect-enhanced in-beam particle growth. Further, formation of polycrystalline Ag nanoparticles was revealed, whose effect on optical absorption was discussed according to the electron mean-free-path mode.