Abstract
SynopsisWe apply a quantum-mechanical model to simulate infrared-streaked photoelectron emission by an ultrashort extreme ultraviolet pulse from adsorbate-covered metal surfaces. Incorporating effects of energy- dependent electron mean-free paths, the properties of initial states, photoelectron energy dispersion, and the screening of the streaking field, this model is able to reproduce recently measured photoelectron spectrograms and adsorbate-thickness-dependent photoemission time delays.
Highlights
Synopsis We apply a quantum-mechanical model to simulate infrared-streaked photoelectron emission by an ultrashort extreme ultraviolet pulse from adsorbate-covered metal surfaces
A recent streaked photoemission experiment with ultrathin Mg adsorbate films on a W(110) substrate [2] reveals a monotonic dependence of the relative photoemission time delay ∆τ4f−2p between W(4f ) and Mg(2p) core-level (CL) photoelectrons and a non-monotonic dependence of the relative photoemission time delay ∆τCB−2p between conduction band (CB) and Mg(2p) CL photoelectrons on the adsorbate thickness
We describe the dispersion of released CB electrons inside the W substrate based on an adjusted effective electron mass (0.86 a.u.)
Summary
Synopsis We apply a quantum-mechanical model to simulate infrared-streaked photoelectron emission by an ultrashort extreme ultraviolet pulse from adsorbate-covered metal surfaces. Incorporating effects of energydependent electron mean-free paths, the properties of initial states, photoelectron energy dispersion, and the screening of the streaking field, this model is able to reproduce recently measured photoelectron spectrograms and adsorbate-thickness-dependent photoemission time delays.
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