Abstract
Ensembles of InAs quantum dots formed at the GaAs(100) surface have been studied by the methods of reflection high-energy electron diffraction and photoluminescence. The amount of deposited InAs corresponds to a wetting layer thickness smaller than the critical value necessary for the transition from two-to three-dimensional growth. It is experimentally shown that, at a deposited film thickness of 1.5 and 1.6 monolayers, islands are formed after keeping the sample in a flow of As4. The influence of the substrate temperature on the kinetic characteristics of the formation of InAs/GaAs islands has been studied.
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