Abstract
Abstract The chemical reactions during the implantation of oxygen ions into a thin beryllium–tungsten alloy layer on a beryllium substrate and subsequent annealing are investigated by depth-resolved chemical analysis using X-ray photoelectron spectroscopy. By using variable photon energies at a synchrotron, identical kinetic energies of the photoelectrons from the different core levels are selected. This enables a chemical analysis at identical depth intervals for all core levels. From these sets of photoelectron spectra chemically resolved depth profiles are determined. The depth profiles allow an interpretation of the reaction and diffusion steps during implantation and annealing steps. This leads to a detailed understanding of the complex processes in a multi-component solid.
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