Abstract
Epitaxial metastable Ge1−yCy alloy layers with y⩽0.035 were grown on Ge(001) from hyperthermal Ge and C atomic beams at deposition temperatures Ts of 250 and 300 °C. The use of hyperthermal beams allows us to controllably vary the concentration of C incorporated as Ge–C split interstitials. Ge1−yCy layers grown with incident Ge-atom energy distributions corresponding to ⩽0.14 lattice displacement per incident atom (dpa) are in a state of in-plane tension and contain significant concentrations of C atoms incorporated in substitutional sites. Increasing the dpa to 0.24 yields layers in compression with C incorporated primarily as Ge–C split interstitials. Ab initio density functional calculations of the formation energies and strain coefficients associated with C atomic arrangements in Ge show that configurations containing multiple C atoms, referred to collectively as C nanoclusters, are energetically more favorable than substitutional C and Ge–C split interstitials and yield a nearly zero average strain. In contrast, substitutional C and Ge–C split interstitials produce large tensile and compressive strains, respectively. Using the calculated strain coefficients, measured layer strains obtained from high-resolution reciprocal lattice maps, and substitutional C concentrations determined by Raman spectroscopy, we obtain the fraction of C atoms incorporated in substitutional, Ge–C split interstitial, and nanocluster sites as a function of the total C concentration y and Ts. We find that at low y and Ts values, all C atoms are incorporated in single-C configurations: substitutional C and Ge–C split interstitials. Their relative concentrations are controlled by the dpa through the production of near-surface Ge self-interstitials which are trapped by substitutional C atoms to form Ge–C split interstitials. Increasing y and Ts, irrespective of the dpa, leads to an increase in the fraction of C nanoclusters, while the fractions of substitutional C and Ge–C split interstitials decrease, due to the higher C–C encounter probability at the growth surface.
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