Quantitative auger electron analysis of titanium nitrides

Abstract

Chemical analysis of titanium nitrides by Auger Electron Spectroscopy is complicated by the fact that the main Auger electron emission from nitrogen occurs at an energy that completely overlaps the transition from titanium. For this reason, most surface analysis of titanium nitride has been semiquantitative, at best. In this paper, Auger spectrum simulation techniques are used to establish that satisfactory accuracy can be attained in the determination of nitrogen to titanium ratios. The relative sensitivity correction factors for nitrogen and titanium matrix effects are calculated and shown to be essentially unity. Relative sensitivity factors are determined using standards and also using an internal calibration technique. Compositions determined by these several methods are compared for ion-implanted nitride films. The technique is also applied to the analysis of a depth profile through a nitride film grown by reaction of Ti with NH3 and characterised by X-ray diffraction.