Abstract
The resonant elastic scattering 16 O(α,α) 16 O at near 3.045 MeV is applied to determine the oxygen concentration in oxide films. By means of the resonance yield, the oxygen concentration in TiO 2 films as well as the oxygen to metal stoichiometry as a function of the depth probed can be deduced. In this paper, TiO 2 films deposited by electron-beam (E-B) evaporation at different oxygen ambiences are analyzed using the method. Our experimental results demonstrate that the oxygen concentration in the films deposited by E-B evaporation is homogeneous, and oxygen pressure in the process of evaporation affects the oxygen concentration in the films drastically. Under our deposition conditions, we found that 1.6×10 −4 Torr is the optimum value of oxygen pressure for forming TiO 2 films by the E-B evaporation method. At this oxygen pressure, we have prepared excellent bandpass filters.
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