Quantitative analysis of sputtering due to ion beam bombardment of solids and biological specimens in high resolution electron microscopy

Abstract

When a positively charged ion beam is used to bombard a solid target, most of the atoms are displaced and sputtered according to the atomic sputtering theory. In the case of biological specimens, most of the bond-breaking molecules in proteins are removed, when based on the molecular sputtering theory. It was found that the thinning rate for solids and the etching rate for biological specimens, when prepared by a normal double fixation and staining method, can be measured from the sputtering yield and density of the specimens. It was also found that the thinning and etching rates depend on the removal weight per sublimation energy and bonding energy, respectively. The angular distribution of sputtering yield, its dependence on incident angle and the secondary electron emission yield were measured, and the optimum etching condition of the incidence was obtained. Experiments showed that the in situ observation of intracellular structures of biological specimens prepared by ion beam etching can be a very effective method in electron microscopy.