Quantitative Analysis of BN (C, O, Ar, H)-Coatings Using EPMA and SIMS

Abstract

Electron probe microanalysis (EPMA) and secondary ion mass spectrometry (SIMS) are applied to the chemical characterization of boron nitride coatings with additional concentrations (1–20 at%) of H, C, O and Ar. Quantitative analysis of homogeneous films with a film thickness >0.3 μm is carried out by conventional “bulk” EPMA with an accuracy of about 5% relative. A similar degree of accuracy is obtained for the simultaneous determination of film thickness (0.1–0.5 μm) and composition (“thin film” EPMA). SIMS based on monitoring MCs+ molecular secondary ions is demonstrated as a useful scheme for quantitative in-depth analysis of matrix elements. In the case of BN (H, C, O, Ar) materials a single standard (e.g., defined by EPMA) is sufficient to establish a set of matrix-independent relative sensitivity factors. The accuracy of quantitative analysis by MCs+-SIMS proves to be 10–20% relative without being influenced by matrix effects arrising from variable (1–20 at%) oxygen concentrations.