Abstract
Atomic layer deposition (ALD) of TiO2 thin films on a Si substrate has been investigated using titanium isopropoxide (TTIP) and tetrakis(dimethylamino)titanium (TDMAT) in combination with water. Th...
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Paper version not known
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Chemistry of materials : a publication of the American Chemical Society
Paper Title
Journal
Date
