Quantification of the Stability of ALD-Grown TiO2 Protective Coatings on Photoanodes for Solar Water Splitting

Abstract

Semiconducting photoabsorbers used in photoelectrochemical applications often exhibit low stability under operating conditions. One strategy implemented in recent years to prevent corrosion of photoelectrodes is the application of thin films of titanium dioxide (TiO2), coated by atomic layer deposition (ALD). However, the stability of these coatings under photoelectrochemical conditions is also limited. We are using spectroscopic ellipsometry (SE) and in-situ atomic force microscope (AFM) characterization[1, 2] in order to quantify the influence of the coating process parameters and of post-deposition treatments on the degradation of these protective layers. Here we show our recent investigations under anodic operation in acidic environment. For fully amorphous TiO2 layers, a significant contributor to the corrosion is a purely chemical process, with an activation energy of 57 kJ/mol. Furthermore, the degradation rate doubles upon illumination under simulated sunlight. With increasing pH, the stability increases significantly. Partially crystalline protective coatings exhibit improved stability under operating conditions in sulfuric acid.