Abstract
The nitrogen implanted profile in aluminum generated by 60keV N2+ bombardment is simulated numerically by the Stopping and Range of Ions in Matter (SRIM) program and is fitted analytically by the Schulz-Wittmaack expression. Taking the SRIM simulated profile as true concentration-depth profile of implanted nitrogen in aluminum matrix, the corresponding measured AES depth profiling data of implanted nitrogen are well fitted by the Mixing-Roughness-Information (MRI) model.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
