Qualitative Analysis of Dual Material Gate (SiO2/HfO2) Underlapped on Drain Side TFET (DMGUD-TFET) Using Work Function Engineering

Naga Swathi Tallapaneni, V Megala

https://doi.org/10.1007/s12633-022-01890-6

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Journal: Silicon	Publication Date: Apr 22, 2022
Citations: 3

Abstract

Qualitative Analysis of Dual Material Gate (SiO2/HfO2) Underlapped on Drain Side TFET (DMGUD-TFET) Using Work Function Engineering

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