Abstract

Quadrupled compact disk-read only-memory (CD-ROM) mastering processes with a 363.8 nm UV light source have been developed. The UV light source exposure power for pit formation is less than that for the 457.9 nm conventional light source, because the photoresist exposure characteristic depends on light source wavelength. The fabricated disk exposed by EFM signals with doubled-linear-density CD format has a 0.8 µm track pitch and about 0.25 µm pit width. Under optimum fabrication exposure power for reduced crosstalk and better modulation amplitude, an excellent jitter value, 10 ns, is achieved for the quadrupled CD-ROM.

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