Abstract
Crystallographic properties of transition metal oxides (MO y and (Ti,M)O y , with 1.9 〈 y 〈 2.5 and M = Ti, Nb and V) as thin films ( e ≈ 50 nm) deposited by r.f. sputtering, were studied by conventional transmission electron microscopy. Samples were annealed by the electron beam (up to 2000 K). Generally, the thin layers were initially amorphous. TiO y samples crystallized according to the TiO 2 anatase and rutile phases. After heating (about 1000 K), NbO y and (Ti, Nb)O y films crystallized according to the NbO 2 and (Ti, Nb)O 2 structures. At higher temperatures, different Nb 2O 5 compounds and unknown phases were formed. VO y layers generally exhibit the formation of the V 6O 13 compound, whereas (Ti, V)O y samples yielded unexpected and unknown compounds (such as V n O 2 n−1 + TiO 2, Ti m V n−m O 2 n−1 ,…).
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