Abstract
This paper reports some significant advantages to be gained by using an active titanium surface as the main pumping element in vacuum systems used for rapid cycling from atmospheric pressure. An evaluation has been carried out on a simple unit particularly suitable for evaporation sputtering and similar plants. Ultra high vacuum techniques are applied to systems where working pressures fall in the range 10 −4 to 10 −6 torr. Chemical pumping is used to remove large quantities of gas to achieve rapid pump down from 10 −1 to 10 −5 torr. With only rotary pump backing ultimate pressures in the range 10 −5 to 7 −6 torr can be achieved, the main constituent in the residual atmosphere being the inert gas argon. The advantages of this system in addition to simplicity and reliability are fast pump down from atmosphere, low hydrocarbon background in the residual spectrum and a very high pumping speed in the work chamber for active gases.
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