Abstract
Nanoscale thin films and multilayers were fabricated by pulsed deposition of single and double vacuum arcs. Vacuum arc plasma sources for particle-free multilayers were coupled with non-magnetic filters to prevent macroparticle transport and contamination of the films. Waveforms of pulsed cathodic arc current and voltage during deposition were monitored using an oscilloscope. Cross-sectional transmission electron microscopy (TEM) results indicate that smooth, well-defined layers are formed with reasonably small interface widths.
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