Abstract
Repetitive bursts of continuous wave plasma polymerization on the minute time scale are found to lead to the deposition of well-defined polymeric nanospheres. This unique mode of film growth is attributed to a high level of monomer replenishment in combination with minimal secondary reaction processes (e.g., fragmentation, cross-linking, and etching). In the case of the 1H,1H,2H,2H-perfluorooctyl acrylate precursor, high contact angle (super-hydrophobic) surfaces are produced by this method.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
