Abstract
Stoichiometric titanium dioxide films comprised of either amorphous or anatase phases have been deposited onto cleaned silica substrates by means of a low pH sol-gel processing method. Coated optics were then exposed to pulsed 1064 nm light from a Nd:YAG laser. Irradiations were performed on samples heated in an oven held at temperatures between 300 and 450 K. A marked decrease in the threshold for catastrophic damage was observed at increased film temperature for both Q-switched and non-Q-switched pulses which is likely due to a thermally induced increase in film residual stress. However, continued irradiation of damaged regions with non-Q-switched pulses at slightly higher temperatures was found to heal the damaged regions. Subsequent irradiation at somewhat higher temperatures generated additional damage sites which could not be healed upon additional irradiation at still higher temperatures. Films were characterized by means of optical transmission measurements, Raman spectroscopy, and optical microscopy. Results demonstrate the influence of ambient film temperature on irradiation damage phenomena.
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