Abstract
Thin films of polytetrafluoroethylene (PTFE) and polyvinylidene fluoride (PVDF) have been formed by the pulsed-laser deposition technique. The structure of the PTFE films depends upon the substrate temperature during deposition. At substrate temperatures from room temperature to 200°C the films were determined to be amorphous. Films formed at higher substrate temperatures contain both amorphous and crystalline components. Transmission IR spectroscopy indicates that the amorphous and the semi-crystalline variants of PTFE are chemically equivalent. The PVDF films were found to be amorphous for all substrate temperatures studied in the range 25°C to 200°C. For both materials it was found that the use of higher substrate temperatures results in the formation of smoother films.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.