Abstract

This paper reports the effect of pulsed bias in comparison with DC bias on reactive deposition of Ti6Al4V-N films, obtained by Grid Assisted Magnetron Sputtering. The results obtained by X-Ray diffraction (XRD), Energy Dispersive X-ray Fluorescence Spectrometer (EDX) and Atomic Force Microscopy (AFM) show that bias condition affects the crystalline texture and change the roughness and morphology of the films. The DC bias favors the film crystallinity, however the pulsed bias produces smoother films.

Highlights

  • Nanostructured surfaces have found growing applications in different areas like optoelectronics, physical chemistry, optics and photonics, photovoltaic cells, photocatalysis, cellular biology, microbiology, biochemistry, electrical and electronic engineering, mechanical and aerospace engineering, among other fields

  • *e-mail: joel@ifsc.edu.br films, this paper investigates the effect of pulsed bias voltage (Vbias) in comparison with DC bias on crystallinity and roughness of Ti6Al4V-N films obtained by reactive deposition, using a grid assisted magnetron sputtering system

  • Films with higher roughness have more intense peaks (111), (200) and (220) of TiN in X-Ray diffraction (XRD) pattern, that are the samples corresponding to DC bias –100V and –200V and pulsed bias –300V at 1kHz and 20% duty cycle

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Summary

Introduction

Nanostructured surfaces have found growing applications in different areas like optoelectronics, physical chemistry, optics and photonics, photovoltaic cells, photocatalysis, cellular biology, microbiology, biochemistry, electrical and electronic engineering, mechanical and aerospace engineering, among other fields. The energy delivered to the substrate during the film deposition depends of several process variables, such as: power source (e.g. DC, pulsed magnetron sputtering (PMS), high power pulsed magnetron sputtering (HIPIMS) and modulated pulsed power magnetron sputtering (MPP))[2,3,4,5]; the anode-cathode geometry[6,7]; the magnetic field configuration[8,9,10], and the substrate bias[11,12] These variables are not independent and it is difficult to do a correlation between them[2,13].

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