Pulse-plating of AuCuCd alloys—I. Experiments under controlled mass transport conditions

Abstract

Pulse-plating of AuCuCd alloys under controlled steady state and non steady state mass transport conditions has been studied using an additive free cyanide electrolyte and a rotating hemispherical electrode. Average current densities ranged from 10 mA cm −2 to 1 A cm −2, pulse current densities from 50 mA cm −2 to 10 A cm −2 and pulse times from 0.2 to 100 ms. The influence of applied pulse parameters on alloy composition was determined. In addition, potential transient were measured and the resulting deposits were studied optically and/or with the scanning electron microscope. Results show that the composition of the deposited alloys and their aspect depends strongly on the choice of applied pulse-parameters.