Abstract
The investigation of TiB 2 electrodeposition was carried out using continuous current plating (CCP) and pulse current plating (PCP), electrochemical techniques to produce a uniform and a very low porosity coating. The solvent used is a fluoride mixture (LiF–NaF–KF) with solutes K 2TiF 6 and KBG 4 in a mass relation of one to four after treatment to remove moisture. The temperature was 600°C and all results were obtained on graphite electrodes as substrate. When necessary, the working electrode potentials were monitored with a Ni/Ni 2+//BN reference electrode. The electrodeposition with pulse current plating produces coatings with better quality, showing fewer cracks and better adhesion to the substrate and no anode effect was observed, when compared with those obtained by continuous current plating, for the conditions: frequencies between 5–100 Hz, t c/ t off between 5/1–3/1 or i c/ i off between 1.5 and 1.8.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
