Abstract
An 18 μm nonmetallized polytetrafluoroethylene (PTFE) film is treated in radio frequency (RF) plasma before a point-to-grid corona charged. The isothermal (170°C) surface potential measurement shows that the surface charge stability is significantly dependent on the plasma sources and treatment conditions. Oxygen (O2), oxygen/helium (O2/He) mixture gases and helium (He) plasma treatment enhance the film negative charge stability significantly but not hydrogen (H2) plasma. Electron spectroscopy chemical analysis confirms that this superior negative charge retention for O2 plasma treatment is a result of the high concentration of oxide groups on the subsurface during the plasma treatment.
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