Abstract
Single crystal InN nanorods were successfully grown on c-Al2O3 by hydride-metalorganic vapor phase epitaxy. The measured resistance of bare InN nanorods does not change upon exposure to hydrogen ambient. The addition of sputter-deposited clusters of Pt onto the surface of the InN nanorods, however, produced a significant change in the measured room temperature resistance. The measured resistance changed systematically by 0.5%–12% as the ambient hydrogen concentration in N2 was varied between 10 and 250 ppm after 15 min exposure time. Importantly, a relatively low power consumption of ∼0.3mW was measured under these conditions. There was no response at room temperature to O2, N2O, or NH3 exposures.
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Schedule a callMore From: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
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