Abstract
(Al 100− x Cr x )N ( x≤36%) protective film with high transmissivity was deposited onto organic photoconductor (OPC) surface by RF reactive magnetron sputtering. The surface hardness was increased by a factor of 1.5–3.2. The OPC surface protected by (Al 100− x Cr x )N ( x≤71%) film was harder than that by AlN film, and the maximum surface hardness was achieved using ∼47% Cr content. The electrophotographic properties of (Al 100− x Cr x )N ( x≤36%) coated OPC are better than those of either uncoated or AlN-coated OPC. These results confirm the suitability of (Al 100− x Cr x )N ( x≤36%) film to prolong the operating life of OPC.
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