Abstract
SiOx/NiCr coatings with different SiOx thicknesses were deposited by the combination of ion implantation (IIP), filter cathode vacuum arc (FCVA), and electron beam (E-beam) evaporation methods to protect flexible Kapton from atomic oxygen (AO) attack. Due to the ion stitching effect and mechanical interlocking of implanted Ni+, the ductility and supporting effect of the fcc γ (Ni-Cr) alloy layer, and the low growth stress of the SiOx, the SiOx/NiCr coatings showed high adhesion and toughness. Exposure tests indicated that the AO erosion yield of the 1 μm-thick SiOx/NiCr-coated Kapton was 5.6 × 10−26 cm3 atom−1, which was attributed to the formation of a compact and continuous thin SiO2 layer. In addition, the inherent kinetic energy and oxidation performance dissipation of AO on the thick inner walls of cracks helped to reduce the cavity cross-sectional area and maximum width in the matrix.
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